Granted Patent
Utility
US 5,605,865 · App. 08/416,124
Method for forming self-aligned silicide in a semiconductor device using vapor phase reaction
Inventors:
Papu D. Maniar, Arkalgud R. Sitaram
Patented Case
View Patent ↗
Granted: Feb 25, 1997
Filed: Apr 3, 1995
Inventors
Papu D. Maniar
Arkalgud R. Sitaram
Assignee (at issue)
Motorola, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.