IP Library Granted Patent US 5,629,113
Granted Patent Utility
US 5,629,113 · App. 08/447,781

Photomask used by photolithography and a process of producing same

Inventor: Hisashi Watanabe
Patented Case View Patent ↗
Granted: May 13, 1997 Filed: May 23, 1995
Inventor
Hisashi Watanabe
Assignee (at issue)
Matsushita Electronics Corporation

This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.

Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 5,629,113
App. No.
08/447,781
Filed
1995-05-23
Granted
1997-05-13
Kind
A