IP Library › Granted Patent US 5,653,894
Granted Patent Utility
US 5,653,894 · App. 08/446,122

Active neural network determination of endpoint in a plasma etch process

Inventors: Dale E. Ibbotson, Tseng-Chung Lee, Helen L. Maynard, Edward A. Rietman
Patented Case View Patent ↗
Granted: Aug 5, 1997 Filed: May 19, 1995
Inventors
Dale E. Ibbotson
Tseng-Chung Lee
Helen L. Maynard
Edward A. Rietman
Assignee (at issue)
LUCENT TECHNOLOGIES INC.

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Quick Facts
Patent No.
US 5,653,894
App. No.
08/446,122
Filed
1995-05-19
Granted
1997-08-05
Kind
A