IP Library › Granted Patent US 5,656,400
Granted Patent Utility
US 5,656,400 · App. 08/699,732

Photomask and pattern forming method employing the same

Inventors: Norio Hasegawa, Fumio Murai, Katsuya Hayano
Patented Case View Patent ↗
Granted: Aug 12, 1997 Filed: Aug 20, 1996
Inventors
Norio Hasegawa
Fumio Murai
Katsuya Hayano
Assignee (at issue)
HITACHI, LTD.

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Quick Facts
Patent No.
US 5,656,400
App. No.
08/699,732
Filed
1996-08-20
Granted
1997-08-12
Kind
A