Granted Patent
Utility
US 5,677,756 · App. 08/344,652
Apparatus for exposing a semiconductor wafer to light including an illumination optical system comprising a glass substrate having light-permeable patterns
Inventor:
Hiroshi Nozue
Patented Case
View Patent ↗
Granted: Oct 14, 1997
Filed: Nov 18, 1994
Inventor
Hiroshi Nozue
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.