IP Library Granted Patent US 5,677,758
Granted Patent Utility
US 5,677,758 · App. 08/386,266

Lithography System using dual substrate stages

Inventors: Robert A. McEachern, Mark Lucas, Craig R. Simpson
Patented Case View Patent ↗
Granted: Oct 14, 1997 Filed: Feb 9, 1995
Inventors
Robert A. McEachern
Mark Lucas
Craig R. Simpson
Assignee (at issue)
MRS Technology, Inc.

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Quick Facts
Patent No.
US 5,677,758
App. No.
08/386,266
Filed
1995-02-09
Granted
1997-10-14
Kind
A