Granted Patent
Utility
US 5,679,499 · App. 08/596,747
Method for forming photo mask for use in fabricating semiconductor device
Inventor:
Atsushi Yamamori
Patented Case
View Patent ↗
Granted: Oct 21, 1997
Filed: Feb 5, 1996
Inventor
Atsushi Yamamori
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.