IP Library Granted Patent US 5,679,608
Granted Patent Utility
US 5,679,608 · App. 08/463,448

Processing techniques for achieving production-worthy, low dielectric, low dielectric, low interconnect resistance and high performance IC

Inventors: Robin Cheung, Mark S. Chang
Patented Case View Patent ↗
Granted: Oct 21, 1997 Filed: Jun 5, 1995
Inventors
Robin Cheung
Mark S. Chang
Assignee (at issue)
Advanced Micro Devices, Inc.

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Quick Facts
Patent No.
US 5,679,608
App. No.
08/463,448
Filed
1995-06-05
Granted
1997-10-21
Kind
A