Granted Patent
Utility
US 5,679,608 · App. 08/463,448
Processing techniques for achieving production-worthy, low dielectric, low dielectric, low interconnect resistance and high performance IC
Inventors:
Robin Cheung, Mark S. Chang
Patented Case
View Patent ↗
Granted: Oct 21, 1997
Filed: Jun 5, 1995
Inventors
Robin Cheung
Mark S. Chang
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.