Granted Patent
Utility
US 5,688,382 · App. 08/521,958
Microwave plasma deposition source and method of filling high aspect-ratio features on a substrate
Inventors:
Matthew Besen, Lawrence P. Bourget, William M. Holber, Donald K. Smith, Richard S. Post
Patented Case
View Patent ↗
Granted: Nov 18, 1997
Filed: Aug 31, 1995
Inventors
Matthew Besen
Lawrence P. Bourget
William M. Holber
Donald K. Smith
Richard S. Post
Assignee (at issue)
Applied Science & Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.