Granted Patent
Utility
US 5,691,235 · App. 08/667,907
Method of depositing tungsten nitride using a source gas comprising silicon
Inventors:
Scott Meikle, Trung T. Doan
Patented Case
View Patent ↗
Granted: Nov 25, 1997
Filed: Jun 12, 1996
Inventors
Scott Meikle
Trung T. Doan
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.