IP Library Granted Patent US 5,693,239
Granted Patent Utility
US 5,693,239 · App. 08/541,898

Polishing slurries comprising two abrasive components and methods for their use

Inventors: Jiun-Fang Wang, Anantha R. Sethuraman, Huey-Ming Wang, Lee Melbourne Cook
Patented Case View Patent ↗
Granted: Dec 2, 1997 Filed: Oct 10, 1995
Inventors
Jiun-Fang Wang
Anantha R. Sethuraman
Huey-Ming Wang
Lee Melbourne Cook
Assignee (at issue)
Rodel Holdings, Inc.

This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.

Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 5,693,239
App. No.
08/541,898
Filed
1995-10-10
Granted
1997-12-02
Kind
A