Granted Patent
Utility
US 5,744,196 · App. 08/678,277
Low temperature deposition of silicon dioxide using organosilanes
Inventors:
Ravi Laxman, Arthur Kenneth Hochberg
Patented Case
View Patent ↗
Granted: Apr 28, 1998
Filed: Jul 11, 1996
Inventors
Ravi Laxman
Arthur Kenneth Hochberg
Assignee (at issue)
Air Products and Chemicals, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.