IP Library Granted Patent US 5,744,835
Granted Patent Utility
US 5,744,835 · App. 08/747,928

MOS semiconductor device with mask layers

Inventor: Hiroyuki Inoue
Patented Case View Patent ↗
Granted: Apr 28, 1998 Filed: Nov 12, 1996
Inventor
Hiroyuki Inoue
Assignee (at issue)
NIPPON STEEL CORPORATION

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Quick Facts
Patent No.
US 5,744,835
App. No.
08/747,928
Filed
1996-11-12
Granted
1998-04-28
Kind
A