Granted Patent
Utility
US 5,760,484 · App. 08/798,560
Alignment mark pattern for semiconductor process
Inventors:
Chang-Hsun Lee, Fu-Cheng Lin, Chen-Tai Kuo
Patented Case
View Patent ↗
Granted: Jun 2, 1998
Filed: Feb 11, 1997
Inventors
Chang-Hsun Lee
Fu-Cheng Lin
Chen-Tai Kuo
Assignee (at issue)
MOSEL VITELIC INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.