Granted Patent
Utility
US 5,776,819 · App. 08/222,720
"Deposition of device quality, low hydrogen content, amorphous silicon films by hot filament technique using ""safe"" silicon source gas"
Inventors:
Archie Harvin Mahan, Edith C. Molenbroek, Brent P. Nelson
Patented Case
View Patent ↗
Granted: Jul 7, 1998
Filed: May 25, 1994
Inventors
Archie Harvin Mahan
Edith C. Molenbroek
Brent P. Nelson
Assignee (at issue)
Midwest Research Institute, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.