Granted Patent
Utility
US 5,776,822 · App. 08/785,279
Method for fabricating semiconductor device having titanium silicide film
Inventors:
Kunihiro Fujii, Hiroshi Ito
Patented Case
View Patent ↗
Granted: Jul 7, 1998
Filed: Jan 23, 1997
Inventors
Kunihiro Fujii
Hiroshi Ito
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.