Granted Patent
Utility
US 5,786,113 · App. 08/670,768
Photo-mask used in aligner for exactly transferring main pattern assisted by semi-transparent auxiliary pattern and process of fabrication thereof
Inventors:
Shuichi Hashimoto, Kunihiko Kasama
Patented Case
View Patent ↗
Granted: Jul 28, 1998
Filed: Jun 24, 1996
Inventors
Shuichi Hashimoto
Kunihiko Kasama
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.