Granted Patent
Utility
US 5,792,591 · App. 08/774,854
Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another
Inventor:
Albert Theuwissen
Patented Case
View Patent ↗
Granted: Aug 11, 1998
Filed: Dec 27, 1996
Inventor
Albert Theuwissen
Assignee (at issue)
U.S. Philips Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.