Granted Patent
Utility
US 5,800,626 · App. 08/801,685
Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates
Inventors:
Susan L. Cohen, Emmanuel I. Cooper, Klaus Penner, David L. Rath, Kamalesh K. Srivastava
Patented Case
View Patent ↗
Granted: Sep 1, 1998
Filed: Feb 18, 1997
Inventors
Susan L. Cohen
Emmanuel I. Cooper
Klaus Penner
David L. Rath
Kamalesh K. Srivastava
Assignee (at issue)
International Business Machines Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.