IP Library Granted Patent US 5,800,951
Granted Patent Utility
US 5,800,951 · App. 08/754,367

Exposure method and exposure mask with monitoring patterns

Inventor: Takeo Hashimoto
Patented Case View Patent ↗
Granted: Sep 1, 1998 Filed: Nov 22, 1996
Inventor
Takeo Hashimoto
Assignee (at issue)
NEC CORPORATION

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Quick Facts
Patent No.
US 5,800,951
App. No.
08/754,367
Filed
1996-11-22
Granted
1998-09-01
Kind
A