Granted Patent
Utility
US 5,804,499 · App. 08/642,294
Prevention of abnormal WSi.sub.x oxidation by in-situ amorphous silicon deposition
Inventors:
Christine Dehm, Reinhard Stengl, Hans-Joerg Timme
Patented Case
View Patent ↗
Granted: Sep 8, 1998
Filed: May 3, 1996
Inventors
Christine Dehm
Reinhard Stengl
Hans-Joerg Timme
Assignee (at issue)
Siemens Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.