Granted Patent
Utility
US 5,821,169 · App. 08/692,379
Hard mask method for transferring a multi-level photoresist pattern
Inventors:
Tue Nguyen, Chien-Hsiung Peng, Bruce D. Ulrich
Patented Case
View Patent ↗
Granted: Oct 13, 1998
Filed: Aug 5, 1996
Inventors
Tue Nguyen
Chien-Hsiung Peng
Bruce D. Ulrich
Assignees (at issue)
Sharp Microelectronics Technology Inc.
SHARP KABUSHIKI KAISHA
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.