IP Library › Granted Patent US 5,835,274
Granted Patent Utility
US 5,835,274 · App. 08/783,901

Mask for patterning a microlens

Inventor: Euy Hyeon Baek
Patented Case View Patent ↗
Granted: Nov 10, 1998 Filed: Jan 16, 1997
Inventor
Euy Hyeon Baek
Assignee (at issue)
LG Semicon Co., Ltd.

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Quick Facts
Patent No.
US 5,835,274
App. No.
08/783,901
Filed
1997-01-16
Granted
1998-11-10
Kind
A