Granted Patent
Utility
US 5,843,518 · App. 08/775,535
Method for making a tantala/silica interference using heat treatment
Inventors:
Hongwen Li, Gautam Bandyopadhyay, Keith A. Klinedinst, Joseph E. Lester
Patented Case
View Patent ↗
Granted: Dec 1, 1998
Filed: Jan 9, 1997
Inventors
Hongwen Li
Gautam Bandyopadhyay
Keith A. Klinedinst
Joseph E. Lester
Assignee (at issue)
OSRAM SYLVANIA Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.