IP Library Granted Patent US 5,858,877
Granted Patent Utility
US 5,858,877 · App. 08/786,482

Self-aligned process for making contacts to silicon substrates during the manufacture of integrated circuits therein

Inventors: Charles H. Dennison, Trung T. Doan
Patented Case View Patent ↗
Granted: Jan 12, 1999 Filed: Jan 21, 1997
Inventors
Charles H. Dennison
Trung T. Doan
Assignee (at issue)
Micron Technology, Inc.

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Quick Facts
Patent No.
US 5,858,877
App. No.
08/786,482
Filed
1997-01-21
Granted
1999-01-12
Kind
A