Granted Patent
Utility
US 5,861,657 · App. 08/783,667
Graded concentration epitaxial substrate for semiconductor device having resurf diffusion
Inventor:
Niraj Ranjan
Patented Case
View Patent ↗
Granted: Jan 19, 1999
Filed: Jan 15, 1997
Inventor
Niraj Ranjan
Assignee (at issue)
International Rectifier Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.