Granted Patent
Utility
US 5,863,339 · App. 08/763,104
Chamber etching of plasma processing apparatus
Inventor:
Tatsuya Usami
Patented Case
View Patent ↗
Granted: Jan 26, 1999
Filed: Dec 10, 1996
Inventor
Tatsuya Usami
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.