IP Library › Granted Patent US 5,871,870
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US 5,871,870 · App. 08/914,571

Mask for forming features on a semiconductor substrate and a method for forming the mask

Inventor: James J. Alwan
Patented Case View Patent ↗
Granted: Feb 16, 1999 Filed: Aug 19, 1997
Inventor
James J. Alwan
Assignee (at issue)
Micron Technology, Inc.

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Quick Facts
Patent No.
US 5,871,870
App. No.
08/914,571
Filed
1997-08-19
Granted
1999-02-16
Kind
A