Granted Patent
Utility
US 5,871,874 · App. 08/917,756
Mask pattern forming method capable of correcting errors by proximity effect and developing process
Inventor:
Keiichiro Tounai
Patented Case
View Patent ↗
Granted: Feb 16, 1999
Filed: Aug 27, 1997
Inventor
Keiichiro Tounai
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.