Granted Patent
Utility
US 5,879,459 · App. 08/920,708
Vertically-stacked process reactor and cluster tool system for atomic layer deposition
Inventors:
Prasad N. Gadgil, Thomas E. Seidel
Patented Case
View Patent ↗
Granted: Mar 9, 1999
Filed: Aug 29, 1997
Inventors
Prasad N. Gadgil
Thomas E. Seidel
Assignee (at issue)
Genus, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.