Granted Patent
Utility
US 5,882,989 · App. 08/934,946
Process for the preparation of silicon wafers having a controlled distribution of oxygen precipitate nucleation centers
Inventor:
Robert J. Falster
Patented Case
View Patent ↗
Granted: Mar 16, 1999
Filed: Sep 22, 1997
Inventor
Robert J. Falster
Assignee (at issue)
MEMC Electronic Materials, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.