Granted Patent
Utility
US 5,885,137 · App. 08/884,118
Chemical mechanical polishing pad conditioner
Inventor:
Robert Ploessl
Patented Case
View Patent ↗
Granted: Mar 23, 1999
Filed: Jun 27, 1997
Inventor
Robert Ploessl
Assignee (at issue)
Siemens Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.