Granted Patent
Utility
US 5,891,749 · App. 08/774,182
Process for forming photoresist pattern in semiconductor device
Inventor:
Ki Yeop Park
Patented Case
View Patent ↗
Granted: Apr 6, 1999
Filed: Dec 26, 1996
Inventor
Ki Yeop Park
Assignee (at issue)
Hyundai Electronics Industries Co. Ltd.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.