Granted Patent
Utility
US 5,902,134 · App. 08/905,736
Dry etching post-treatment method and method for manufacturing a semiconductor device
Inventor:
Kyoko Egashira
Patented Case
View Patent ↗
Granted: May 11, 1999
Filed: Aug 4, 1997
Inventor
Kyoko Egashira
Assignee (at issue)
Matsushita Electronics Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.