IP Library › Granted Patent US 5,909,626
Granted Patent Utility
US 5,909,626 · App. 08/826,046

SOI substrate and fabrication process therefor

Inventor: Kenya Kobayashi
Patented Case View Patent ↗
Granted: Jun 1, 1999 Filed: Mar 28, 1997
Inventor
Kenya Kobayashi
Assignee (at issue)
NEC CORPORATION

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Quick Facts
Patent No.
US 5,909,626
App. No.
08/826,046
Filed
1997-03-28
Granted
1999-06-01
Kind
A