Granted Patent
Utility
US 5,933,729 · App. 08/986,953
Reduction of ONO fence during self-aligned etch to eliminate poly stringers
Inventor:
Maria C. Chan
Patented Case
View Patent ↗
Granted: Aug 3, 1999
Filed: Dec 8, 1997
Inventor
Maria C. Chan
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.