Granted Patent
Utility
US 5,935,744 · App. 08/982,647
Method of drawing patterns through electron beam exposure utilizing target subpatterns and varied exposure quantity
Inventor:
Ken Nakajima
Patented Case
View Patent ↗
Granted: Aug 10, 1999
Filed: Dec 2, 1997
Inventor
Ken Nakajima
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.