IP Library › Granted Patent US 5,940,689
Granted Patent Utility
US 5,940,689 · App. 08/885,921

Method of fabricating UMOS semiconductor devices using a self-aligned, reduced mask process

Inventors: Christopher L. Rexer, Mark L. Rineheimer, John Manning Savidge Neilson, Thomas E. Grebs
Patented Case View Patent ↗
Granted: Aug 17, 1999 Filed: Jun 30, 1997
Inventors
Christopher L. Rexer
Mark L. Rineheimer
John Manning Savidge Neilson
Thomas E. Grebs
Assignee (at issue)
HARRIS CORPORATION

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Quick Facts
Patent No.
US 5,940,689
App. No.
08/885,921
Filed
1997-06-30
Granted
1999-08-17
Kind
A