Granted Patent
Utility
US 5,945,237 · App. 08/998,834
Halftone phase-shift mask and halftone phase-shift mask defect correction method
Inventor:
Hiroyoshi Tanabe
Patented Case
View Patent ↗
Granted: Aug 31, 1999
Filed: Dec 29, 1997
Inventor
Hiroyoshi Tanabe
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.