Granted Patent
Utility
US 5,955,037 · App. 08/775,838
Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
Inventors:
Mark Holst, Kent Carpenter, Scott Lane, Prakash V. Arya
Patented Case
View Patent ↗
Granted: Sep 21, 1999
Filed: Dec 31, 1996
Inventors
Mark Holst
Kent Carpenter
Scott Lane
Prakash V. Arya
Assignee (at issue)
ATMI Ecosys Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.