Granted Patent
Utility
US 5,955,244 · App. 08/704,471
Method for forming photoresist features having reentrant profiles using a basic agent
Inventor:
Paul J. Duval
Patented Case
View Patent ↗
Granted: Sep 21, 1999
Filed: Aug 20, 1996
Inventor
Paul J. Duval
Assignee (at issue)
Quantum Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.