Granted Patent
Utility
US 5,963,829 · App. 08/617,647
Method of forming silicide film
Inventor:
Yoshihisa Matsubara
Patented Case
View Patent ↗
Granted: Oct 5, 1999
Filed: Mar 15, 1996
Inventor
Yoshihisa Matsubara
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.