Granted Patent
Utility
US 5,965,203 · App. 08/643,599
Method for depositing a silicon oxide layer
Inventors:
Zvonimir Gabric, Oswald Spindler
Patented Case
View Patent ↗
Granted: Oct 12, 1999
Filed: May 6, 1996
Inventors
Zvonimir Gabric
Oswald Spindler
Assignee (at issue)
Siemens Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.