Granted Patent
Utility
US 5,965,310 · App. 09/041,656
Process of patterning photo resist layer extending over step of underlying layer without deformation of pattern
Inventor:
Mitsuharu Yamana
Patented Case
View Patent ↗
Granted: Oct 12, 1999
Filed: Mar 13, 1998
Inventor
Mitsuharu Yamana
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.