Granted Patent
Utility
US 5,977,553 · App. 09/034,328
Mechanism for preventing metallic ion contamination of a wafer in ion implantation equipment
Inventors:
Sang G. Oh, Chang-eob Soh
Patented Case
View Patent ↗
Granted: Nov 2, 1999
Filed: Mar 4, 1998
Inventors
Sang G. Oh
Chang-eob Soh
Assignee (at issue)
SAMSUNG DISPLAY CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.