Granted Patent
Utility
US 5,985,375 · App. 09/146,640
Method for pulsed-plasma enhanced vapor deposition
Inventors:
Kevin G. Donohoe, Gurtej S. Sandhu
Patented Case
View Patent ↗
Granted: Nov 16, 1999
Filed: Sep 3, 1998
Inventors
Kevin G. Donohoe
Gurtej S. Sandhu
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.