Granted Patent
Utility
US 5,989,969 · App. 08/926,408
Method of producing silicon layer having surface controlled to be uneven
Inventors:
Hirohito Watanabe, Ichiro Honma
Patented Case
View Patent ↗
Granted: Nov 23, 1999
Filed: Sep 8, 1997
Inventors
Hirohito Watanabe
Ichiro Honma
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.