Granted Patent
Utility
US 5,993,547 · App. 09/005,131
Edge rinse mechanism for removing a peripheral portion of a resist film formed on a wafer
Inventor:
Hiroshi Sato
Patented Case
View Patent ↗
Granted: Nov 30, 1999
Filed: Jan 9, 1998
Inventor
Hiroshi Sato
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.