Granted Patent
Utility
US 5,994,231 · App. 08/996,920
Process for depositing a stratified dielectric structure for enhancing the planarity of semiconductor electronic devices
Inventors:
Patrizia Sonego, Elio Colabella, Maurizio Bacchetta, Luca Pividori
Patented Case
View Patent ↗
Granted: Nov 30, 1999
Filed: Dec 23, 1997
Inventors
Patrizia Sonego
Elio Colabella
Maurizio Bacchetta
Luca Pividori
Assignee (at issue)
SGS-Thomson Microelectronics S.A.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.