Granted Patent
Utility
US 6,001,707 · App. 09/241,760
Method for forming shallow trench isolation structure
Inventors:
Chih-Hung Lin, Gary Hong
Patented Case
View Patent ↗
Granted: Dec 14, 1999
Filed: Feb 1, 1999
Inventors
Chih-Hung Lin
Gary Hong
Assignee (at issue)
United Semiconductor Corp.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.